R14
Chemical name:
R14 Tetrafluoromethane
Property chloride
Melting point° C -183.6
Boiling point° C -128.1
Critical Temperature° C -45.67
Critical Pressure, Mpa 3.73
Critical Density, m3/mol 7.1
Application: CF4 can be widely used in etching of silicon, Sio2, Sin4, phosphorus silicon glass and tungsten film material, and also can be used in the electronic components surface cleaning and solar battery production, laser technology, space technology, space technology, metal smelting, meteorological insulation, low temperature refrigerantion and etc.
R14
Chemical name:
R14 Tetrafluoromethane
Property chloride
Melting point° C -183.6
Boiling point° C -128.1
Critical Temperature° C -45.67
Critical Pressure, Mpa 3.73
Critical Density, m3/mol 7.1
Application: CF4 can be widely used in etching of silicon, Sio2, Sin4, phosphorus silicon glass and tungsten film material, and also can be used in the electronic components surface cleaning and solar battery production, laser technology, space technology, space technology, metal smelting, meteorological insulation, low temperature refrigerantion and etc.
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